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An alternative approach for femtosecond laser induced black silicon in ambient air

Ma, Y. / Ren, H. / Si, J. / Sun, X. / Shi, H. / Chen, T. / Chen, F. / Hou, X.

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An alternative approach for femtosecond laser induced black silicon in ambient air

Ma, Y. / Ren, H. / Si, J. / Sun, X. / Shi, H. / Chen, T. / Chen, F. / Hou, X.

An alternative approach for femtosecond laser induced black silicon in ambient air

Ma, Y. / Ren, H. / Si, J. / Sun, X. / Shi, H. / Chen, T. / Chen, F. / Hou, X.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

An alternative approach for femtosecond laser induced black silicon in ambient air

Contributors:

Ma, Y. (author) / Ren, H. (author) / Si, J. (author) / Sun, X. (author) / Shi, H. (author) / Chen, T. (author) / Chen, F. (author) / Hou, X. (author)

Published in:

APPLIED SURFACE SCIENCE ; 261 ; 722-726

Publication date:

2012-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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