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The diffusivity of the vacancy in silicon: Is it fast or slow?

Voronkov, V. V. / Falster, R.

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The diffusivity of the vacancy in silicon: Is it fast or slow?

Voronkov, V. V. / Falster, R.

The diffusivity of the vacancy in silicon: Is it fast or slow?

Voronkov, V. V. / Falster, R.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The diffusivity of the vacancy in silicon: Is it fast or slow?

Contributors:

Voronkov, V. V. (author) / Falster, R. (author) / Bracht, H. / Impellizzeri, G.

Published in:

New Aspects of Si- and Ge-based Materials and Devices ; 697-702

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 15

Publication date:

2012-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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