Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution: Fid-Bau Portal

Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution

Zhang, H. / Komori, T. / Mohamad, Z. / Yin, Y. / Hosaka, S.

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Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution

Zhang, H. / Komori, T. / Mohamad, Z. / Yin, Y. / Hosaka, S.

Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution

Zhang, H. / Komori, T. / Mohamad, Z. / Yin, Y. / Hosaka, S.

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Document information

Title:

Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution

Contributors:

Zhang, H. (author) / Komori, T. (author) / Mohamad, Z. (author) / Yin, Y. (author) / Hosaka, S. (author) / Hosaka, S.

Published in:

Advanced Micro-Device Engineering III ; 107-112

KEY ENGINEERING MATERIALS ; 534

Publication date:

2013-01-01

Size:

6 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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