Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry: Fid-Bau Portal

Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry

Karmakov, Y. / Paskaleva, A.

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Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry

Karmakov, Y. / Paskaleva, A.

Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry

Karmakov, Y. / Paskaleva, A.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry

Contributors:

Karmakov, Y. (author) / Paskaleva, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 271 ; 12-18

Publication date:

2013-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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