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    Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks

    New search for: Paskaleva, A.
    New search for: Tapajna, M.
    New search for: Dobrocka, E.
    New search for: Husekova, K.
    New search for: Atanassova, E.
    New search for: Frohlich, K.

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    Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks

    New search for: Paskaleva, A.
    New search for: Tapajna, M.
    New search for: Dobrocka, E.
    New search for: Husekova, K.
    New search for: Atanassova, E.
    New search for: Frohlich, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks

    New search for: Paskaleva, A.
    New search for: Tapajna, M.
    New search for: Dobrocka, E.
    New search for: Husekova, K.
    New search for: Atanassova, E.
    New search for: Frohlich, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks

    Contributors:

    Paskaleva, A. (author) / Tapajna, M. (author) / Dobrocka, E. (author) / Husekova, K. (author) / Atanassova, E. (author) / Frohlich, K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 7876-7880

    Publication date:

    2011-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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