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    Nanopore Formation on SOI(100) by CH~3SiH~3 Pulse Jet CVD: SiC Growth Temperature Dependence

    New search for: Ikoma, Y.
    New search for: Nishino, Y.
    New search for: Anan, S.
    New search for: Abe, T.
    New search for: Sakita, H.
    New search for: Zhu, S.
    New search for: Ni, B.
    New search for: Ju, D.

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    Nanopore Formation on SOI(100) by CH~3SiH~3 Pulse Jet CVD: SiC Growth Temperature Dependence

    New search for: Ikoma, Y.
    New search for: Nishino, Y.
    New search for: Anan, S.
    New search for: Abe, T.
    New search for: Sakita, H.
    New search for: Zhu, S.
    New search for: Ni, B.
    New search for: Ju, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanopore Formation on SOI(100) by CH~3SiH~3 Pulse Jet CVD: SiC Growth Temperature Dependence

    New search for: Ikoma, Y.
    New search for: Nishino, Y.
    New search for: Anan, S.
    New search for: Abe, T.
    New search for: Sakita, H.
    New search for: Zhu, S.
    New search for: Ni, B.
    New search for: Ju, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Nanopore Formation on SOI(100) by CH~3SiH~3 Pulse Jet CVD: SiC Growth Temperature Dependence

    Contributors:

    Ikoma, Y. (author) / Nishino, Y. (author) / Anan, S. (author) / Abe, T. (author) / Sakita, H. (author) / Zhu, S. / Ni, B. / Ju, D.

    Published in:

    Advanced Materials Science and Technology ; 252-255

    MATERIALS SCIENCE FORUM ; 750

    Publication date:

    2013-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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