Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing: Fid-Bau Portal

Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing

Li, W. / Varlamov, S. / Dore, J. / Green, M.

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Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing

Li, W. / Varlamov, S. / Dore, J. / Green, M.

Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing

Li, W. / Varlamov, S. / Dore, J. / Green, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Defect annealing in ultra-thin polycrystalline silicon films on glass: Rapid thermal versus laser processing

Contributors:

Li, W. (author) / Varlamov, S. (author) / Dore, J. (author) / Green, M. (author)

Published in:

MATERIALS LETTERS ; 107 ; 1-4

Publication date:

2013-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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