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Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Penta, N. K. / Amanapu, H. P. / Peethala, B. C. / Babu, S. V.

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Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Penta, N. K. / Amanapu, H. P. / Peethala, B. C. / Babu, S. V.

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Penta, N. K. / Amanapu, H. P. / Peethala, B. C. / Babu, S. V.

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Check availability in my library

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Document information

Title:

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Contributors:

Penta, N. K. (author) / Amanapu, H. P. (author) / Peethala, B. C. (author) / Babu, S. V. (author)

Published in:

APPLIED SURFACE SCIENCE ; 283 ; 986-992

Publication date:

2013-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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