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    On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]

    New search for: Vanhellemont, J.
    New search for: Simoen, E.

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    On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]

    New search for: Vanhellemont, J.
    New search for: Simoen, E.

    Access

    Access via TIB
    Check availability in my library
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    On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]

    New search for: Vanhellemont, J.
    New search for: Simoen, E.

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Title:

    On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]

    Contributors:

    Vanhellemont, J. (author) / Simoen, E. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 17 ; 184-185

    Publication date:

    2014-01-01

    Size:

    2 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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