A platform for research: civil engineering, architecture and urbanism
On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]
On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]
On the diffusion and activation of n-type dopants in Ge [Mater. Sci. Semicond. Process. 15 (2012) 642-655]
Vanhellemont, J. (author) / Simoen, E. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 17 ; 184-185
2014-01-01
2 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2016
|British Library Online Contents | 2016
|On the diffusion and activation of n-type dopants in Ge
British Library Online Contents | 2012
|British Library Online Contents | 2012