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    Improvement of high-temperature resistance of the Ag-based multilayer films deposited by magnetron sputtering

    New search for: Yang, J.
    New search for: Zhao, H.
    New search for: Sha, H.
    New search for: Li, J.
    New search for: Zhao, L.
    New search for: Chen, J.
    New search for: Yu, B.
    New search for: Zhang, F.

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    Improvement of high-temperature resistance of the Ag-based multilayer films deposited by magnetron sputtering

    New search for: Yang, J.
    New search for: Zhao, H.
    New search for: Sha, H.
    New search for: Li, J.
    New search for: Zhao, L.
    New search for: Chen, J.
    New search for: Yu, B.
    New search for: Zhang, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Improvement of high-temperature resistance of the Ag-based multilayer films deposited by magnetron sputtering

    New search for: Yang, J.
    New search for: Zhao, H.
    New search for: Sha, H.
    New search for: Li, J.
    New search for: Zhao, L.
    New search for: Chen, J.
    New search for: Yu, B.
    New search for: Zhang, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Improvement of high-temperature resistance of the Ag-based multilayer films deposited by magnetron sputtering

    Contributors:

    Yang, J. (author) / Zhao, H. (author) / Sha, H. (author) / Li, J. (author) / Zhao, L. (author) / Chen, J. (author) / Yu, B. (author) / Zhang, F. (author)

    Published in:

    MATERIALS LETTERS ; 118 ; 62-65

    Publication date:

    2014-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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