About the key factors driving the resistivity of AuO"x thin films grown by reactive magnetron sputtering: Fid-Bau Portal

About the key factors driving the resistivity of AuO"x thin films grown by reactive magnetron sputtering

Dolique, V. / Thomann, A. L. / Millon, E. / Petit, A. / Brault, P.

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About the key factors driving the resistivity of AuO"x thin films grown by reactive magnetron sputtering

Dolique, V. / Thomann, A. L. / Millon, E. / Petit, A. / Brault, P.

About the key factors driving the resistivity of AuO"x thin films grown by reactive magnetron sputtering

Dolique, V. / Thomann, A. L. / Millon, E. / Petit, A. / Brault, P.

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Check availability in my library

Order at Subito €

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Document information

Title:

About the key factors driving the resistivity of AuO"x thin films grown by reactive magnetron sputtering

Contributors:

Dolique, V. (author) / Thomann, A. L. (author) / Millon, E. (author) / Petit, A. (author) / Brault, P. (author)

Published in:

APPLIED SURFACE SCIENCE ; 295 ; 194-197

Publication date:

2014-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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