A platform for research: civil engineering, architecture and urbanism
Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films
Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films
Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films
Szymanska, M. (author) / Gieraltowska, S. (author) / Wachnicki, L. (author) / Grobelny, M. (author) / Makowska, K. (author) / Mroczynski, R. (author)
APPLIED SURFACE SCIENCE ; 301 ; 28-33
2014-01-01
6 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Reactive DC Magnetron Sputtering of Vanadium Oxide Thin Films
British Library Online Contents | 2008
|British Library Online Contents | 2004
|British Library Online Contents | 1997
|Properties of zirconia thin films prepared by reactive magnetron sputtering
British Library Online Contents | 2007
|Structural and electrical properties of Ta-Al thin films by magnetron sputtering
British Library Online Contents | 1999
|