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    Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

    New search for: Szymanska, M.
    New search for: Gieraltowska, S.
    New search for: Wachnicki, L.
    New search for: Grobelny, M.
    New search for: Makowska, K.
    New search for: Mroczynski, R.

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    Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

    New search for: Szymanska, M.
    New search for: Gieraltowska, S.
    New search for: Wachnicki, L.
    New search for: Grobelny, M.
    New search for: Makowska, K.
    New search for: Mroczynski, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

    New search for: Szymanska, M.
    New search for: Gieraltowska, S.
    New search for: Wachnicki, L.
    New search for: Grobelny, M.
    New search for: Makowska, K.
    New search for: Mroczynski, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

    Contributors:

    Szymanska, M. (author) / Gieraltowska, S. (author) / Wachnicki, L. (author) / Grobelny, M. (author) / Makowska, K. (author) / Mroczynski, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 301 ; 28-33

    Publication date:

    2014-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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