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Structural and electrical properties of Ta-Al thin films by magnetron sputtering

Wuu, D.-S. / Chan, C.-C. / Horng, R.-H. / Lin, W.-C. / Chiu, S.L. / Wu, Y.Y.

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Structural and electrical properties of Ta-Al thin films by magnetron sputtering

Wuu, D.-S. / Chan, C.-C. / Horng, R.-H. / Lin, W.-C. / Chiu, S.L. / Wu, Y.Y.

Structural and electrical properties of Ta-Al thin films by magnetron sputtering

Wuu, D.-S. / Chan, C.-C. / Horng, R.-H. / Lin, W.-C. / Chiu, S.L. / Wu, Y.Y.

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Title:

Structural and electrical properties of Ta-Al thin films by magnetron sputtering

Contributors:

Wuu, D.-S. (author) / Chan, C.-C. (author) / Horng, R.-H. (author) / Lin, W.-C. (author) / Chiu, S.L. (author) / Wu, Y.Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 144 ; 315-318

Publication date:

1999-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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