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Properties of Al Ohmic Contacts to n-type 4H-SiC Employing a Phosphorus-Doped and Crystallized Amorphous-Silicon Interlayer
Properties of Al Ohmic Contacts to n-type 4H-SiC Employing a Phosphorus-Doped and Crystallized Amorphous-Silicon Interlayer
Properties of Al Ohmic Contacts to n-type 4H-SiC Employing a Phosphorus-Doped and Crystallized Amorphous-Silicon Interlayer
Hanafusa, H. (author) / Ohta, A. (author) / Ashihara, R. (author) / Maruyama, K. (author) / Mizuno, T. (author) / Hayashi, S. (author) / Murakami, H. (author) / Higashi, S. (author) / Okumura, H. / Harima, H.
2014-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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