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    Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

    New search for: Velişa, G.
    New search for: Trocellier, P.
    New search for: Thomé, L.
    New search for: Vaubaillon, S.
    New search for: Sattonnay, G. l.
    New search for: Miro, S.
    New search for: Serruys, Y.

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    Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

    New search for: Velişa, G.
    New search for: Trocellier, P.
    New search for: Thomé, L.
    New search for: Vaubaillon, S.
    New search for: Sattonnay, G. l.
    New search for: Miro, S.
    New search for: Serruys, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

    New search for: Velişa, G.
    New search for: Trocellier, P.
    New search for: Thomé, L.
    New search for: Vaubaillon, S.
    New search for: Sattonnay, G. l.
    New search for: Miro, S.
    New search for: Serruys, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

    Contributors:

    Velişa, G. (author) / Trocellier, P. (author) / Thomé, L. (author) / Vaubaillon, S. (author) / Sattonnay, G. l. (author) / Miro, S. (author) / Serruys, Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 49 ; 4899-4904

    Publication date:

    2014-01-01

    Size:

    6 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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