Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films: Fid-Bau Portal

Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Aramwit, C. / Intarasiri, S. / Bootkul, D. / Tippawan, U. / Supsermpol, B. / Seanphinit, N. / Ruangkul, W. / Yu, L. D.

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Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Aramwit, C. / Intarasiri, S. / Bootkul, D. / Tippawan, U. / Supsermpol, B. / Seanphinit, N. / Ruangkul, W. / Yu, L. D.

Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Aramwit, C. / Intarasiri, S. / Bootkul, D. / Tippawan, U. / Supsermpol, B. / Seanphinit, N. / Ruangkul, W. / Yu, L. D.

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Document information

Title:

Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

Contributors:

Aramwit, C. (author) / Intarasiri, S. (author) / Bootkul, D. (author) / Tippawan, U. (author) / Supsermpol, B. (author) / Seanphinit, N. (author) / Ruangkul, W. (author) / Yu, L. D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 310 ; 266-271

Publication date:

2014-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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