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Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Lin, Y. H. (author) / Syue, Y. C. (author) / Lin, H. D. (author) / Chen, U. S. (author) / Chang, Y. S. (author) / Chen, J. R. (author) / Shih, H. C. (author)
APPLIED SURFACE SCIENCE ; 255 ; 2139-2142
2008-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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