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    Thermal stability and surface behaviors of CeO2/Si films during in-situ vacuum annealing

    New search for: Luo, L.
    New search for: Chen, J.
    New search for: Wang, X.

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    Thermal stability and surface behaviors of CeO2/Si films during in-situ vacuum annealing

    New search for: Luo, L.
    New search for: Chen, J.
    New search for: Wang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal stability and surface behaviors of CeO2/Si films during in-situ vacuum annealing

    New search for: Luo, L.
    New search for: Chen, J.
    New search for: Wang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Thermal stability and surface behaviors of CeO2/Si films during in-situ vacuum annealing

    Contributors:

    Luo, L. (author) / Chen, J. (author) / Wang, X. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 322 ; 111-115

    Publication date:

    2014-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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