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In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution
In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution
In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution
Cunha, L. (author) / Apreutesei, M. (author) / Moura, C. (author) / Alves, E. (author) / Barradas, N.P. (author) / Cristea, D. (author)
Applied surface science ; 438 ; 14-19
2018-01-01
6 pages
Article (Journal)
English
DDC:
620.44
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