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    Effect of Ar Plasma Treatment on Resistive Switching of ZnO Thin Films

    New search for: Fu, B.
    New search for: Zhu Ge, F.
    New search for: Liu, Z.-m.
    New search for: Luo, H.
    New search for: Liang, L.-y.
    New search for: Gao, J.-h.
    New search for: Cao, H.-t.

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    Effect of Ar Plasma Treatment on Resistive Switching of ZnO Thin Films

    New search for: Fu, B.
    New search for: Zhu Ge, F.
    New search for: Liu, Z.-m.
    New search for: Luo, H.
    New search for: Liang, L.-y.
    New search for: Gao, J.-h.
    New search for: Cao, H.-t.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of Ar Plasma Treatment on Resistive Switching of ZnO Thin Films

    New search for: Fu, B.
    New search for: Zhu Ge, F.
    New search for: Liu, Z.-m.
    New search for: Luo, H.
    New search for: Liang, L.-y.
    New search for: Gao, J.-h.
    New search for: Cao, H.-t.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of Ar Plasma Treatment on Resistive Switching of ZnO Thin Films

    Contributors:

    Fu, B. (author) / Zhu Ge, F. (author) / Liu, Z.-m. (author) / Luo, H. (author) / Liang, L.-y. (author) / Gao, J.-h. (author) / Cao, H.-t. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 32 ; 922-924

    Publication date:

    2014-01-01

    Size:

    3 pages

    ISSN:

    1673-2812

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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