Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films: Fid-Bau Portal

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Park, M. H. / Lee, Y. H. / Kim, H. J. / Kim, Y. J. / Moon, T. / Kim, K. D. / Mller, J. / Kersch, A. / Schroeder, U. / Mikolajick, T.

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Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Park, M. H. / Lee, Y. H. / Kim, H. J. / Kim, Y. J. / Moon, T. / Kim, K. D. / Mller, J. / Kersch, A. / Schroeder, U. / Mikolajick, T.

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Park, M. H. / Lee, Y. H. / Kim, H. J. / Kim, Y. J. / Moon, T. / Kim, K. D. / Mller, J. / Kersch, A. / Schroeder, U. / Mikolajick, T.

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Document information

Title:

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Contributors:

Park, M. H. (author) / Lee, Y. H. (author) / Kim, H. J. (author) / Kim, Y. J. (author) / Moon, T. (author) / Kim, K. D. (author) / Mller, J. (author) / Kersch, A. (author) / Schroeder, U. (author) / Mikolajick, T. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 27 ; 1811-1831

Publication date:

2015-01-01

Size:

21 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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