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    Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam

    New search for: Xiao, Y. J.
    New search for: Fang, F. Z.
    New search for: Xu, Z. W.
    New search for: Hu, X. T.

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    Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam

    New search for: Xiao, Y. J.
    New search for: Fang, F. Z.
    New search for: Xu, Z. W.
    New search for: Hu, X. T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam

    New search for: Xiao, Y. J.
    New search for: Fang, F. Z.
    New search for: Xu, Z. W.
    New search for: Hu, X. T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam

    Contributors:

    Xiao, Y. J. (author) / Fang, F. Z. (author) / Xu, Z. W. (author) / Hu, X. T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 343 ; 56-69

    Publication date:

    2015-01-01

    Size:

    14 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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