Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning: Fid-Bau Portal

Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

Zamani, H. / Lee, S.W. / Avishai, A. / Zorman, C.A. / Sankaran, R.M. / Feng, P.X.L.

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Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

Zamani, H. / Lee, S.W. / Avishai, A. / Zorman, C.A. / Sankaran, R.M. / Feng, P.X.L.

Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

Zamani, H. / Lee, S.W. / Avishai, A. / Zorman, C.A. / Sankaran, R.M. / Feng, P.X.L.

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Title:

Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

Contributors:

Zamani, H. (author) / Lee, S.W. (author) / Avishai, A. (author) / Zorman, C.A. (author) / Sankaran, R.M. (author) / Feng, P.X.L. (author)

Published in:

MATERIALS SCIENCE FORUM ; 717/720 ; 889-892

Publication date:

2012-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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