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Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam
Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam
Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam
Xiao, Y. J. (Autor:in) / Fang, F. Z. (Autor:in) / Xu, Z. W. (Autor:in) / Hu, X. T. (Autor:in)
APPLIED SURFACE SCIENCE ; 343 ; 56-69
01.01.2015
14 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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