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    Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications

    New search for: Wu, B. R.
    New search for: Tsai, T. H.
    New search for: Wuu, D. S.

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    Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications

    New search for: Wu, B. R.
    New search for: Tsai, T. H.
    New search for: Wuu, D. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications

    New search for: Wu, B. R.
    New search for: Tsai, T. H.
    New search for: Wuu, D. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications

    Contributors:

    Wu, B. R. (author) / Tsai, T. H. (author) / Wuu, D. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 354 ; 216-220

    Publication date:

    2015-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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