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Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Huang, J. J. (author) / Tsai, Y. J. (author) / Tsai, M. C. (author) / Huang, L. T. (author) / Lee, M. H. (author) / Chen, M. J. (author)
APPLIED SURFACE SCIENCE ; 324 ; 662-668
2015-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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