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Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
Huang, J. J. (Autor:in) / Tsai, Y. J. (Autor:in) / Tsai, M. C. (Autor:in) / Huang, L. T. (Autor:in) / Lee, M. H. (Autor:in) / Chen, M. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 324 ; 662-668
01.01.2015
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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