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HfO2 gate dielectric on Ge (111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment
HfO2 gate dielectric on Ge (111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment
HfO2 gate dielectric on Ge (111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment
Agrawal, K. S. (author) / Patil, V. S. (author) / Khairnar, A. G. (author) / Mahajan, A. M. (author)
APPLIED SURFACE SCIENCE ; 364 ; 747-751
2016-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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