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TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films

Pichler, M. / Pergolesi, D. / Landsmann, S. / Chawla, V. / Michler, J. / Döbeli, M. / Wokaun, A. / Lippert, T.

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TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films

Pichler, M. / Pergolesi, D. / Landsmann, S. / Chawla, V. / Michler, J. / Döbeli, M. / Wokaun, A. / Lippert, T.

TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films

Pichler, M. / Pergolesi, D. / Landsmann, S. / Chawla, V. / Michler, J. / Döbeli, M. / Wokaun, A. / Lippert, T.

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Check availability in my library

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Document information

Title:

TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films

Contributors:

Pichler, M. (author) / Pergolesi, D. (author) / Landsmann, S. (author) / Chawla, V. (author) / Michler, J. (author) / Döbeli, M. (author) / Wokaun, A. (author) / Lippert, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 369 ; 67-75

Publication date:

2016-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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