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TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films
TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films
TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films
Pichler, Markus (author) / Pergolesi, Daniele (author) / Landsmann, Steve (author) / Chawla, Vipin (author) / Michler, Johann (author) / Döbeli, Max (author) / Wokaun, Alexander (author) / Lippert, Thomas (author)
Applied surface science ; 369 ; 67-75
2016-01-01
9 pages
Article (Journal)
English
DDC:
620.44
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TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films
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