Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering: Fid-Bau Portal

Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

Jiang, J. / Wang, Y. / Du, J. / Yang, H. / Hao, J.

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Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

Jiang, J. / Wang, Y. / Du, J. / Yang, H. / Hao, J.

Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

Jiang, J. / Wang, Y. / Du, J. / Yang, H. / Hao, J.

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Check availability in my library

Order at Subito €

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Document information

Title:

Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

Contributors:

Jiang, J. (author) / Wang, Y. (author) / Du, J. (author) / Yang, H. (author) / Hao, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 379 ; 516-522

Publication date:

2016-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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