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Palladium-free electroless deposition of pure copper film on glass substrate using hydrazine as reducing agent
Palladium-free electroless deposition of pure copper film on glass substrate using hydrazine as reducing agent
Palladium-free electroless deposition of pure copper film on glass substrate using hydrazine as reducing agent
Nobari, N. (author) / Behboudnia, M. (author) / Maleki, R. (author)
APPLIED SURFACE SCIENCE ; 385 ; 9-17
2016-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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