Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon: Fid-Bau Portal

Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon

Martin, T. P. / Jones, K. S. / Camillo-Castillo, R. A. / Hatem, C. / Xin, Y. / Elliman, R. G.

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Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon

Martin, T. P. / Jones, K. S. / Camillo-Castillo, R. A. / Hatem, C. / Xin, Y. / Elliman, R. G.

Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon

Martin, T. P. / Jones, K. S. / Camillo-Castillo, R. A. / Hatem, C. / Xin, Y. / Elliman, R. G.

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Title:

Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon

Contributors:

Martin, T. P. (author) / Jones, K. S. (author) / Camillo-Castillo, R. A. (author) / Hatem, C. (author) / Xin, Y. (author) / Elliman, R. G. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 52 ; 10387-10392

Publication date:

2017-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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