A platform for research: civil engineering, architecture and urbanism
Suppression of boron diffusion using carbon co-implantation in DRAM
Suppression of boron diffusion using carbon co-implantation in DRAM
Suppression of boron diffusion using carbon co-implantation in DRAM
Lee, Suk Hun (author) / Park, Se Geun (author) / Kim, Shin Deuk (author) / Jung, Hyuck-Chai (author) / Kim, Il Gweon (author) / Kang, Dong-Ho (author) / Kim, Dae Jung (author) / Lee, Kyu Pil (author) / Choi, Joo Sun (author) / Baek, Jung-Woo (author)
Materials research bulletin ; 82 ; 22-25
2016-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Suppression of uphill diffusion caused by phosphorus deactivation using carbon implantation
British Library Online Contents | 2015
|Suppression of uphill diffusion caused by phosphorus deactivation using carbon implantation
British Library Online Contents | 2015
|British Library Online Contents | 2005
|Boron diffusion in presence of defects induced by helium implantation
British Library Online Contents | 2005
|Boron ion implantation for tribological applications
British Library Online Contents | 1997
|