Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Suppression of boron diffusion using carbon co-implantation in DRAM
Suppression of boron diffusion using carbon co-implantation in DRAM
Suppression of boron diffusion using carbon co-implantation in DRAM
Lee, Suk Hun (Autor:in) / Park, Se Geun (Autor:in) / Kim, Shin Deuk (Autor:in) / Jung, Hyuck-Chai (Autor:in) / Kim, Il Gweon (Autor:in) / Kang, Dong-Ho (Autor:in) / Kim, Dae Jung (Autor:in) / Lee, Kyu Pil (Autor:in) / Choi, Joo Sun (Autor:in) / Baek, Jung-Woo (Autor:in)
Materials research bulletin ; 82 ; 22-25
01.01.2016
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Suppression of uphill diffusion caused by phosphorus deactivation using carbon implantation
British Library Online Contents | 2015
|Suppression of uphill diffusion caused by phosphorus deactivation using carbon implantation
British Library Online Contents | 2015
|British Library Online Contents | 2005
|Boron diffusion in presence of defects induced by helium implantation
British Library Online Contents | 2005
|Boron ion implantation for tribological applications
British Library Online Contents | 1997
|