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    Metal-assisted chemical etching for designable monocrystalline silicon nanostructure

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    Metal-assisted chemical etching for designable monocrystalline silicon nanostructure

    New search for: Li, Meicheng
    New search for: Li, Yingfeng
    New search for: Liu, Wenjian
    New search for: Yue, Luo
    New search for: Li, Ruike
    New search for: Luo, Younan
    New search for: Trevor, Mwenya
    New search for: Jiang, Bing
    New search for: Bai, Fan
    New search for: Fu, Pengfei
    New search for: Zhao, Yan
    New search for: Shen, Chao
    New search for: Mbengue, Joseph Michel

    Access

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    Check availability in my library
    Order at Subito €

    Metal-assisted chemical etching for designable monocrystalline silicon nanostructure

    New search for: Li, Meicheng
    New search for: Li, Yingfeng
    New search for: Liu, Wenjian
    New search for: Yue, Luo
    New search for: Li, Ruike
    New search for: Luo, Younan
    New search for: Trevor, Mwenya
    New search for: Jiang, Bing
    New search for: Bai, Fan
    New search for: Fu, Pengfei
    New search for: Zhao, Yan
    New search for: Shen, Chao
    New search for: Mbengue, Joseph Michel

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Metal-assisted chemical etching for designable monocrystalline silicon nanostructure

    Contributors:

    Li, Meicheng (author) / Li, Yingfeng (author) / Liu, Wenjian (author) / Yue, Luo (author) / Li, Ruike (author) / Luo, Younan (author) / Trevor, Mwenya (author) / Jiang, Bing (author) / Bai, Fan (author) / Fu, Pengfei (author)

    Published in:

    Materials research bulletin ; 76 ; 436-449

    Publication date:

    2016-01-01

    Size:

    14 pages

    ISSN:

    0025-5408

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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