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    Silicon-Carbon alloy film formation on Si(100) using SiH4 and CH4 reaction under low-energy ECR Ar plasma irradiation

    New search for: Sasaki, Shogo
    New search for: Sakuraba, Masao
    New search for: Akima, Hisanao
    New search for: Sato, Shigeo

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    Silicon-Carbon alloy film formation on Si(100) using SiH4 and CH4 reaction under low-energy ECR Ar plasma irradiation

    New search for: Sasaki, Shogo
    New search for: Sakuraba, Masao
    New search for: Akima, Hisanao
    New search for: Sato, Shigeo

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Silicon-Carbon alloy film formation on Si(100) using SiH4 and CH4 reaction under low-energy ECR Ar plasma irradiation

    New search for: Sasaki, Shogo
    New search for: Sakuraba, Masao
    New search for: Akima, Hisanao
    New search for: Sato, Shigeo

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Silicon-Carbon alloy film formation on Si(100) using SiH4 and CH4 reaction under low-energy ECR Ar plasma irradiation

    Contributors:

    Sasaki, Shogo (author) / Sakuraba, Masao (author) / Akima, Hisanao (author) / Sato, Shigeo (author)

    Published in:

    Materials science in semiconductor processing ; 70 ; 188-192

    Publication date:

    2017-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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