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    Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition

    New search for: Nie, X.
    New search for: Ma, D.
    New search for: Ma, F.
    New search for: Xu, K.

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    Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition

    New search for: Nie, X.
    New search for: Ma, D.
    New search for: Ma, F.
    New search for: Xu, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition

    New search for: Nie, X.
    New search for: Ma, D.
    New search for: Ma, F.
    New search for: Xu, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition

    Contributors:

    Nie, X. (author) / Ma, D. (author) / Ma, F. (author) / Xu, K. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 52 ; 11524-11536

    Publication date:

    2017-01-01

    Size:

    13 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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