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    Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition

    New search for: Chiba, Hirokazu
    New search for: Hirano, Masaki
    New search for: Kawano, Kazuhisa
    New search for: Oshima, Noriaki
    New search for: Funakubo, Hiroshi

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    Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition

    New search for: Chiba, Hirokazu
    New search for: Hirano, Masaki
    New search for: Kawano, Kazuhisa
    New search for: Oshima, Noriaki
    New search for: Funakubo, Hiroshi

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition

    New search for: Chiba, Hirokazu
    New search for: Hirano, Masaki
    New search for: Kawano, Kazuhisa
    New search for: Oshima, Noriaki
    New search for: Funakubo, Hiroshi

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition

    Contributors:

    Chiba, Hirokazu (author) / Hirano, Masaki (author) / Kawano, Kazuhisa (author) / Oshima, Noriaki (author) / Funakubo, Hiroshi (author)

    Published in:

    Materials science in semiconductor processing ; 70 ; 73-77

    Publication date:

    2017-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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