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    Process parameter selection study on SiNx:H films by PECVD method for silicon solar cells

    New search for: Wu, Xiaosong
    New search for: Zhang, Zaifang
    New search for: Liu, Yuan
    New search for: Chu, Xuening
    New search for: Li, Yupeng

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    Process parameter selection study on SiNx:H films by PECVD method for silicon solar cells

    New search for: Wu, Xiaosong
    New search for: Zhang, Zaifang
    New search for: Liu, Yuan
    New search for: Chu, Xuening
    New search for: Li, Yupeng

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Process parameter selection study on SiNx:H films by PECVD method for silicon solar cells

    New search for: Wu, Xiaosong
    New search for: Zhang, Zaifang
    New search for: Liu, Yuan
    New search for: Chu, Xuening
    New search for: Li, Yupeng

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Process parameter selection study on SiNx:H films by PECVD method for silicon solar cells

    Contributors:

    Wu, Xiaosong (author) / Zhang, Zaifang (author) / Liu, Yuan (author) / Chu, Xuening (author) / Li, Yupeng (author)

    Published in:

    Solar energy ; 111 ; 277-287

    Publication date:

    2015-01-01

    Size:

    11 pages

    ISSN:

    0038-092X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.47

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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