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Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Zhou, H. P. / Wei, D. Y. / Xu, L. X. / Guo, Y. N. / Xiao, S. Q. / Huang, S. Y. / Xu, S.

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Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Zhou, H. P. / Wei, D. Y. / Xu, L. X. / Guo, Y. N. / Xiao, S. Q. / Huang, S. Y. / Xu, S.

Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Zhou, H. P. / Wei, D. Y. / Xu, L. X. / Guo, Y. N. / Xiao, S. Q. / Huang, S. Y. / Xu, S.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Contributors:

Zhou, H. P. (author) / Wei, D. Y. (author) / Xu, L. X. (author) / Guo, Y. N. (author) / Xiao, S. Q. (author) / Huang, S. Y. (author) / Xu, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 264 ; 21-26

Publication date:

2013-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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