Improvement on the electrical characteristics of Pd/HfO2/6H-SiC MIS capacitors using post deposition annealing and post metallization annealing

Esakky, Papanasam / Kailath, Binsu J | British Library Online Contents | 2017

Effect of the post-deposition annealing on electrical characteristics of MIS structures with HfO2/SiO2 gate dielectric stacks

Taube, A. / Mroczynski, R. / Korwin-Mikke, K. et al. | British Library Online Contents | 2012

Layer structure variations of ultra-thin HfO2 films induced by post-deposition annealing

Fu, W. E. / Chang, Y. Q. | British Library Online Contents | 2011

Rapid thermal post-metallization annealing effect on thin gate oxides

Jeng, M.-J. / Lin, H.-S. / Hwu, J.-G. | British Library Online Contents | 1996

Post-deposition annealing of RF-sputtered zinc-oxide films

Bekman, H. H. P. T. / Benoist, K. W. / Joppe, J. L. | British Library Online Contents | 1993