Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface: Fid-Bau Portal

Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Vishwanath, V. / Demenev, E. / Giubertoni, D. / Vanzetti, L. / Koh, A.L. / Steinhauser, G. / Pepponi, G. / Bersani, M. / Meirer, F. / Foad, M.A.

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Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Vishwanath, V. / Demenev, E. / Giubertoni, D. / Vanzetti, L. / Koh, A.L. / Steinhauser, G. / Pepponi, G. / Bersani, M. / Meirer, F. / Foad, M.A.

Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Vishwanath, V. / Demenev, E. / Giubertoni, D. / Vanzetti, L. / Koh, A.L. / Steinhauser, G. / Pepponi, G. / Bersani, M. / Meirer, F. / Foad, M.A.

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Document information

Title:

Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Contributors:

Vishwanath, V. (author) / Demenev, E. (author) / Giubertoni, D. (author) / Vanzetti, L. (author) / Koh, A.L. (author) / Steinhauser, G. (author) / Pepponi, G. (author) / Bersani, M. (author) / Meirer, F. (author) / Foad, M.A. (author)

Published in:

Applied surface science ; 355 ; 792-799

Publication date:

2015-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44

Vishwanath, V. / Demenev, E. / Giubertoni, D. et al. | British Library Online Contents | 2015

Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface

Vishwanath, V. / Demenev, E. / Giubertoni, D. et al. | British Library Online Contents | 2015

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Wan, G. J. / Huang, N. / Yang, P. et al. | British Library Online Contents | 2007