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Platelet activation behavior on nitrogen plasma-implanted silicon

Wan, G. J. / Huang, N. / Yang, P. / Fu, R. K. / Ho, J. P. / Xie, X. / Zhou, H. F. / Chu, P. K.

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Platelet activation behavior on nitrogen plasma-implanted silicon

Wan, G. J. / Huang, N. / Yang, P. / Fu, R. K. / Ho, J. P. / Xie, X. / Zhou, H. F. / Chu, P. K.

Platelet activation behavior on nitrogen plasma-implanted silicon

Wan, G. J. / Huang, N. / Yang, P. / Fu, R. K. / Ho, J. P. / Xie, X. / Zhou, H. F. / Chu, P. K.

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Document information

Title:

Platelet activation behavior on nitrogen plasma-implanted silicon

Contributors:

Wan, G. J. (author) / Huang, N. (author) / Yang, P. (author) / Fu, R. K. (author) / Ho, J. P. (author) / Xie, X. (author) / Zhou, H. F. (author) / Chu, P. K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 27 ; 928-932

Publication date:

2007-01-01

Size:

5 pages

ISSN:

0928-4931

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 660

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