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    Low temperature solution processed high-κ ZrO2 gate dielectrics for nanoelectonics

    New search for: Kumar, Arvind
    New search for: Mondal, Sandip
    New search for: Rao, K.S.R. Koteswara

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    Low temperature solution processed high-κ ZrO2 gate dielectrics for nanoelectonics

    New search for: Kumar, Arvind
    New search for: Mondal, Sandip
    New search for: Rao, K.S.R. Koteswara

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low temperature solution processed high-κ ZrO2 gate dielectrics for nanoelectonics

    New search for: Kumar, Arvind
    New search for: Mondal, Sandip
    New search for: Rao, K.S.R. Koteswara

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Low temperature solution processed high-κ ZrO2 gate dielectrics for nanoelectonics

    Contributors:

    Kumar, Arvind (author) / Mondal, Sandip (author) / Rao, K.S.R. Koteswara (author)

    Published in:

    Applied surface science ; 370 ; 373-379

    Publication date:

    2016-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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