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High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Finnegan, Patrick S. / Hollowell, Andrew E. / Arrington, Christian L. / Dagel, Amber L.

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High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Finnegan, Patrick S. / Hollowell, Andrew E. / Arrington, Christian L. / Dagel, Amber L.

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Finnegan, Patrick S. / Hollowell, Andrew E. / Arrington, Christian L. / Dagel, Amber L.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Contributors:

Finnegan, Patrick S. (author) / Hollowell, Andrew E. (author) / Arrington, Christian L. (author) / Dagel, Amber L. (author)

Published in:

Materials science in semiconductor processing ; 92 ; 80-85

Publication date:

2019-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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