Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching: Fid-Bau Portal

Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching

Liu, Y. / Sun, W. / Jiang, Y. / Zhao, X. Z.

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Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching

Liu, Y. / Sun, W. / Jiang, Y. / Zhao, X. Z.

Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching

Liu, Y. / Sun, W. / Jiang, Y. / Zhao, X. Z.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Fabrication of bifacial wafer-scale silicon nanowire arrays with ultra-high aspect ratio through controllable metal-assisted chemical etching

Contributors:

Liu, Y. (author) / Sun, W. (author) / Jiang, Y. (author) / Zhao, X. Z. (author)

Published in:

MATERIALS LETTERS ; 139 ; 437-442

Publication date:

2015-01-01

Size:

6 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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