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High-density ZrC ceramic target preparation method
The invention discloses a high-density ZrC ceramic target preparation method. The method comprises putting a graphite grinding tool containing ZrC micro powder in a cavity of a plasma activation sintering furnace, raising the temperature to be in a range of 1800 DEG C to 1900 DEG C at a temperature raising rate ranging from 150 DEG C/min to 300 DEG C/min, preserving the temperature for 4 minutes to 6 minutes, and applying axial pressure in a range of 10MPa to 30MPa; cooling samples in the furnace to the room temperature to obtain ZrC ceramic targets. According to the method, the produced ZrC ceramic targets are single in phase and large in size the density (> 94%) is still high without adding any sintering aids, and the application prospect is quite broad.
High-density ZrC ceramic target preparation method
The invention discloses a high-density ZrC ceramic target preparation method. The method comprises putting a graphite grinding tool containing ZrC micro powder in a cavity of a plasma activation sintering furnace, raising the temperature to be in a range of 1800 DEG C to 1900 DEG C at a temperature raising rate ranging from 150 DEG C/min to 300 DEG C/min, preserving the temperature for 4 minutes to 6 minutes, and applying axial pressure in a range of 10MPa to 30MPa; cooling samples in the furnace to the room temperature to obtain ZrC ceramic targets. According to the method, the produced ZrC ceramic targets are single in phase and large in size the density (> 94%) is still high without adding any sintering aids, and the application prospect is quite broad.
High-density ZrC ceramic target preparation method
LI JUNGUO (author) / WANG BO (author) / YANG HAITAO (author) / SHEN QIANG (author) / ZHANG LIANMENG (author)
2015-08-19
Patent
Electronic Resource
English
IPC:
C04B
Kalk
,
LIME
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