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Preparation method of high-density, high-purity and large-size ceramic target material
The invention discloses a preparation method of a high-density, high-purity and large-size ceramic target material, which comprises the following steps: using conventional high-purity yttrium oxide partially stabilized zirconium oxide powder, carrying out variety selection and particle mixing, carrying out ball-milling mixing, adding necessary binder and dispersant to prepare slurry, and freeze-drying the slurry to obtain the high-density, high-purity and large-size ceramic target material. The preparation method comprises the following steps: sintering at the high temperature of 1200-1400 DEG C by adopting a medium pre-pressing method after simple mechanical forming, and shaping to obtain the ceramic target material which has the purity of 99.95% or above, the height of 300mm and the density adjustable in the range of 3.5-6.0 g/cm < 3 > and meets the use requirements of physical vapor deposition or magnetron sputtering equipment and the like.
本发明公开了一种高密度、高纯度、大尺寸陶瓷靶材的制备方法，使用常规的高纯度氧化钇部分稳定氧化锆粉体，经过种类选择和颗粒混合后，球磨混合并加入必要的粘结剂、分散剂制成浆料，冷冻干燥上述的浆料，经过简单的机械成型后采用介质预压法在高温1200℃至1400℃烧结，整形加工后可获得纯度99.95％以上、高度300mm、密度在3.5～6.0g/cm3范围内可调，满足物理气相沉积或磁控溅射等设备的使用要求的陶瓷靶材。
Preparation method of high-density, high-purity and large-size ceramic target material
The invention discloses a preparation method of a high-density, high-purity and large-size ceramic target material, which comprises the following steps: using conventional high-purity yttrium oxide partially stabilized zirconium oxide powder, carrying out variety selection and particle mixing, carrying out ball-milling mixing, adding necessary binder and dispersant to prepare slurry, and freeze-drying the slurry to obtain the high-density, high-purity and large-size ceramic target material. The preparation method comprises the following steps: sintering at the high temperature of 1200-1400 DEG C by adopting a medium pre-pressing method after simple mechanical forming, and shaping to obtain the ceramic target material which has the purity of 99.95% or above, the height of 300mm and the density adjustable in the range of 3.5-6.0 g/cm < 3 > and meets the use requirements of physical vapor deposition or magnetron sputtering equipment and the like.
本发明公开了一种高密度、高纯度、大尺寸陶瓷靶材的制备方法，使用常规的高纯度氧化钇部分稳定氧化锆粉体，经过种类选择和颗粒混合后，球磨混合并加入必要的粘结剂、分散剂制成浆料，冷冻干燥上述的浆料，经过简单的机械成型后采用介质预压法在高温1200℃至1400℃烧结，整形加工后可获得纯度99.95％以上、高度300mm、密度在3.5～6.0g/cm3范围内可调，满足物理气相沉积或磁控溅射等设备的使用要求的陶瓷靶材。
Preparation method of high-density, high-purity and large-size ceramic target material
高密度、高纯度、大尺寸陶瓷靶材的制备方法
YUE XIN (author) / LYU YANQING (author) / XIAO FEI (author) / ZHANG FULIN (author) / HAN XIAOYING (author) / ZHAO HONGJIAN (author)
2022-03-18
Patent
Electronic Resource
Chinese
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