A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
High-temperature infrared-radiation ceramic coating and preparation method thereof
The invention discloses a high-temperature infrared-radiation ceramic coating and a preparation method thereof. The coating comprises hafnium oxide, niobium carbide, nickel oxide, chromium oxide, titanium boride and spinel structure chromium oxide nickel; and the coating is prepared by sputtering a ceramic target material through an unbalanced magnetron sputtering method, wherein the density of ceramic target material is 4-5 g/cm<3>, the relative density is more than or equal to 97%, the resistivity is less than or equal to 0.5 Omega.cm. The thickness of the high-temperature infrared-radiationceramic coating is 10 to 20 microns, and the surface roughness Ra is 0.5-1 micron. According to the coating, the infrared-radiation ceramic coating which is high in radiation rate, good in thermal stability, compact in coating and high in bonding strength is prepared by adopting unbalanced magnetron sputtering, and the radiation rate range from 0.90 to 0.93in the range of 1000 DEG C to 1600 DEG C.
本发明公开一种高温红外辐射陶瓷涂层及其制备方法，涂层组成包括氧化铪、碳化铌、氧化镍、氧化铬、硼化钛、尖晶石结构氧化铬镍；其通过非平衡磁控溅射方法溅射陶瓷靶材制备。所述陶瓷靶材密度为4‑5g/cm，相对密度≥97％、电阻率≤0.5Ω·cm。所述高温红外辐射陶瓷涂层厚度为10‑20μm、表面粗糙度Ra为0.5‑1μm。本发明通过采用非平衡磁控溅射制备得到高辐射率、热稳定性良好且涂层致密、结合强度高的红外辐射陶瓷涂层，1000‑1600℃范围内的辐射率范围在0.90‑0.93之间。
High-temperature infrared-radiation ceramic coating and preparation method thereof
The invention discloses a high-temperature infrared-radiation ceramic coating and a preparation method thereof. The coating comprises hafnium oxide, niobium carbide, nickel oxide, chromium oxide, titanium boride and spinel structure chromium oxide nickel; and the coating is prepared by sputtering a ceramic target material through an unbalanced magnetron sputtering method, wherein the density of ceramic target material is 4-5 g/cm<3>, the relative density is more than or equal to 97%, the resistivity is less than or equal to 0.5 Omega.cm. The thickness of the high-temperature infrared-radiationceramic coating is 10 to 20 microns, and the surface roughness Ra is 0.5-1 micron. According to the coating, the infrared-radiation ceramic coating which is high in radiation rate, good in thermal stability, compact in coating and high in bonding strength is prepared by adopting unbalanced magnetron sputtering, and the radiation rate range from 0.90 to 0.93in the range of 1000 DEG C to 1600 DEG C.
本发明公开一种高温红外辐射陶瓷涂层及其制备方法，涂层组成包括氧化铪、碳化铌、氧化镍、氧化铬、硼化钛、尖晶石结构氧化铬镍；其通过非平衡磁控溅射方法溅射陶瓷靶材制备。所述陶瓷靶材密度为4‑5g/cm，相对密度≥97％、电阻率≤0.5Ω·cm。所述高温红外辐射陶瓷涂层厚度为10‑20μm、表面粗糙度Ra为0.5‑1μm。本发明通过采用非平衡磁控溅射制备得到高辐射率、热稳定性良好且涂层致密、结合强度高的红外辐射陶瓷涂层，1000‑1600℃范围内的辐射率范围在0.90‑0.93之间。
High-temperature infrared-radiation ceramic coating and preparation method thereof
一种高温红外辐射陶瓷涂层及其制备方法
WANG AIPING (author)
2020-08-04
Patent
Electronic Resource
Chinese
High-temperature ceramic coating layer and preparation method thereof
| European Patent Office | 2021
Preparation method of normal-temperature high-radiance infrared radiation ceramic material
| European Patent Office | 2021
High-temperature wear-resistant ceramic coating and preparation method thereof
| European Patent Office | 2020
HTEE series high-temperature infrared radiation coating and use method thereof
| European Patent Office | 2020
Silicon carbide infrared radiation ceramic material and preparation method thereof
| European Patent Office | 2020